Facility Contacts

NNF Main Contacts

Dr. Jacob John

Primary User Contact | NNF Coordinator

855 N 16th Street
N214A NANO
Lincoln, NE 68588-0298
Mobile: 214-707-0026
Office: 402-472-6147
Fax: 402-472-6148
jjohn7@unl.edu

Jacob John

Dr. Andrei Sokolov

Research Technologist

855 N 16th Street
007 Jorgensen Hall
Lincoln, NE 68588-0298
Phone: 402-472-3839
Fax: 402-472-6148
sokolov@unl.edu

Andrei Sokolov

Laser Nanofabrication and Characterization

Nanoscribe System
The Nanoscribe system is a 3D lithography setup enabling the maskless lithography and patterning of polymer materials. This is achieved through two main writing techniques. The first is the fixed-beam moving-sample, in which the target can be moved in three dimensions. The piezo actuators used in this design realize the precise focus trajectory. In the second technique, the laser beam is moved allowing a faster processing speed. The Nanoscribe system is a useful tool for fabrication of 3D architectures that are currently required in optics, microfluidics, medicine, etc.

Zygo Optical Profiler
The Zygo optical surface profiler is a powerful tool in non-contact analysis at the surface of the samples. The open work area with X/Y and tilt stages can be adjusted for focus both manually and automatically enables the user to conduct a nondestructive and fast surface study on the sample. The profiler uses coherence scanning interferometry to record the surface morphology in 3D, with vertical resolution from < 1 nm to 20000 μm.

Low-Dimensional Nanostructure Synthesis

Cluster-Deposition Systems
We have constructed two gas-aggregation cluster deposition systems. The one shown, funded by an NSF MRI grant, has two sources that can produce elemental or alloy clusters with diameters between 1 and 20 nm. The clusters are monodispersed with σ/d ≈ 0.1 and can have new structures not seen in the bulk. Nanoscale composite structures are possible with novel properties.

Atomic Layer Deposition (ALD)
The Cambridge Nanotech atomic-layer-deposition tool Fiji 200, is a state-of-the-art instrument. The attached load-lock allows for handling of wafers up to 8” and layer-by-layer growth can be achieved by a thermal, plasma, or ozone process. The available six heated precursor lines, including ‘ALD Vapor Boost’ technology, together with six plasma gas lines, allow for a wide variety of different processes. Attached is an M-2000U ellipsometer (245 to 1000 nm) for in-situ process control and development.

Glancing Angle Deposition (GLAD)
The glancing-angle-deposition chamber is an ultra-high vacuum deposition chamber built in-house and dedicated to the growth of sculptured thin films by electron-beam evaporation. A key part is a three-axis sample manipulator with continuous polar and computer-controlled azimuthal sample rotation. Samples are introduced through a load-lock system to allow quick sample exchange procedures and ultra-high-vacuum conditions.

Chemical Synthesis of Nanowires and 2D Systems
A variety of synthetic methods are employed to fabricate 2D materials applicable to nanoelectronic devices, nanostructured molecular organic frameworks, nanoscale biomimetic materials, and surface coatings. Electrochemical processes are used to develop sensors, thin films and composites. Self-assembly via CVD synthesis, preparation of active surfaces and stretchable microfluidic systems, new transition-metal dichalcogenides and phosphorene, and other methods for nanostructured materials are available.